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NICKEL SILICIDE FORMATION IN ELECTROLESS PLATED FILMS ON SILICON - LOW-TEMPERATURE GROWTH OF NI3SI2, MORPHOLOGY AND ELECTRICAL-RESISTANCE

NICKEL SILICIDE FORMATION IN ELECTROLESS PLATED FILMS ON SILICON - LOW-TEMPERATURE GROWTH OF NI3SI2, MORPHOLOGY AND ELECTRICAL-RESISTANCE

Nayak, B.B.; Singh, S.K.; Acharya, B.S.
Citation: Thin Solid Films, 171(2), 1989: 277-290
URI: http://ore.immt.res.in/handle/2018/284
Date: 1989
Document Type: Journal Article
Copyright: Copyright [1989]. All efforts have been made to respect the copyright to the best of our knowledge. Inadvertent omissions, if brought to our notice, stand for correction and withdrawal of document from this repository.

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