| dc.contributor.author |
Nayak, B.B. |
|
| dc.contributor.author |
Singh, S.K. |
|
| dc.contributor.author |
Acharya, B.S. |
|
| dc.date.accessioned |
2018-10-01T12:19:16Z |
|
| dc.date.available |
2018-10-01T12:19:16Z |
|
| dc.date.issued |
1989 |
|
| dc.identifier.citation |
Thin Solid Films, 171(2), 1989: 277-290 |
|
| dc.identifier.issn |
0040-6090 |
|
| dc.identifier.uri |
http://ore.immt.res.in/handle/2018/284 |
|
| dc.language |
en |
|
| dc.publisher |
Elsevier |
|
| dc.relation.isreferencedby |
SCI |
|
| dc.rights |
Copyright [1989]. All efforts have been made to respect the copyright to the best of our knowledge. Inadvertent omissions, if brought to our notice, stand for correction and withdrawal of document from this repository. |
|
| dc.subject |
Materials Sciences |
|
| dc.subject |
Materials Sciences |
|
| dc.subject |
Physical Sciences |
|
| dc.subject |
Physical Sciences |
|
| dc.title |
NICKEL SILICIDE FORMATION IN ELECTROLESS PLATED FILMS ON SILICON - LOW-TEMPERATURE GROWTH OF NI3SI2, MORPHOLOGY AND ELECTRICAL-RESISTANCE |
|
| dc.type |
Journal Article |
|
| dc.affiliation.author |
CSIR-IMMT, Bhubaneswar 751013, Odisha, India |
|