Tungsten nitride-Nickel (WN/Ni) multilayer thin films were prepared using reactive magnetron sputtering by varying the Ni interlayer thickness. Microstructure and phase composition were examined using FESEM/EDAX and GIXRD respectively. The mechanical property of the multilayers was calculated using Berkovich nanoindenter. GIXRD showed well defined peaks of W2N phase. Cross-sectional FESEM confirms the alternate layers of WN and Ni having uniform thickness. Mechanical properties showrd that the hardness decreases as the thickness of the soft Ni layer decreases.
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