| dc.contributor.author |
Acharya, B.S. |
|
| dc.contributor.author |
Nayak, B.B. |
|
| dc.contributor.editor |
Nair, C.G.K. |
|
| dc.contributor.editor |
Raj, B. |
|
| dc.contributor.editor |
Nurthy, C.R.L. |
|
| dc.contributor.editor |
Jayakumar, T. |
|
| dc.date.accessioned |
2018-10-01T12:19:58Z |
|
| dc.date.available |
2018-10-01T12:19:58Z |
|
| dc.date.issued |
1996 |
|
| dc.identifier.citation |
Trends In NDE Science And Technology - Proceedings Of The 14th World Conference On NDT (14th WCNDT), Vols 1-5, 1996: 893-896 |
|
| dc.identifier.isbn |
90-5410-740-5 |
|
| dc.identifier.uri |
http://ore.immt.res.in/handle/2018/541 |
|
| dc.description.abstract |
X-Ray diffraction has been used as a tool to characterize Bi2S3, PbS, CdS and their alloy films. Nickel silicide films grown on silicon substrate have also been characterized for thier phase identification. It has been found that Ni3Si2 phase grows even at low temperature in presence of some impurities in the film. |
|
| dc.language |
en |
|
| dc.publisher |
A A Balkema |
|
| dc.relation.isbasedon |
14th World Conference on NDT - Trends in NDE Science and Technology (14th WCNDT)., New Delhi, India; DEC 08-13, 1996 |
|
| dc.relation.isreferencedby |
SCI |
|
| dc.rights |
Copyright [1996]. All efforts have been made to respect the copyright to the best of our knowledge. Inadvertent omissions, if brought to our notice, stand for correction and withdrawal of document from this repository. |
|
| dc.subject |
Materials Sciences |
|
| dc.title |
X-ray diffraction as a nondestructive tool for characterization of thin films, nanocrystalline and refractory materials |
|
| dc.type |
Proceedings Paper |
|
| dc.affiliation.author |
CSIR-IMMT, Bhubaneswar 751013, Odisha, India |
|