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In Situ Regenerative Adduct Assisted p-Type Doping of Organic Semiconductor

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dc.contributor.author Patel, B. K. en
dc.contributor.author Vidhan, A. en
dc.contributor.author Gupta, S. en
dc.contributor.author Arunachalam, V. en
dc.contributor.author Nayak, S. en
dc.contributor.author Bhatt, N. en
dc.contributor.author Singh, R. S. en
dc.contributor.author Sarkar, S. K. en
dc.contributor.author Nayak, P. K. en
dc.date.accessioned 2026-06-24T09:00:58Z
dc.date.available 2026-06-24T09:00:58Z
dc.date.issued 2026
dc.identifier.citation Advanced Materials, vol.38(34), 2026 en
dc.identifier.issn 0935-9648, 1521-4095 en
dc.identifier.uri http://ore.immt.res.in/handle/2018/3969
dc.description.abstract Organic semiconductors (OSCs) are leading materials for next-generation optoelectronic devices. Effective charge transport in devices often requires electronic doping of OSCs. Conventional methods using molecular dopants or metal salts often suffer from poor efficiency, undesirable side products, and require additives and prolonged incubation. Under device operational conditions, these undesirable side products and additives lead to degradation in device performance. Here, an in situ regenerative adduct-assisted (IRAA) doping is presented, which is rapid, metal-ion-free, and requires no additives for dopant stabilization, enabling clean and efficient doping of various OSCs. Spectroscopic analyses reveal a self-regenerating adduct as the active doping species. The simplicity of the doping method and the range of materials available open new avenues for the development of diverse electronic-doping strategies, providing a scalable and universal approach to doping OSC-based hole-transporting layers for various types of optoelectronic devices, including halide perovskite solar cells. en
dc.language.iso en en
dc.publisher Wiley-V C H Verlag Gmbh en
dc.relation.isreferencedby SCI en
dc.subject Chemical Sciences en
dc.title In Situ Regenerative Adduct Assisted p-Type Doping of Organic Semiconductor en
dc.type Journal Article en
dc.affiliation.author Tata Institute of Fundamental Research, Hyderabad, India en


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