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A study of diamond like carbon/chromium films deposited by microwave plasma activated chemical vapor deposition

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dc.contributor.author Sahoo, S.
dc.contributor.author Pradhan, Siddhartha Kumar
dc.contributor.author Jeevitha, M.
dc.contributor.author Bagchi, S.
dc.contributor.author Barhai, P.K.
dc.date.accessioned 2018-10-01T12:25:25Z
dc.date.available 2018-10-01T12:25:25Z
dc.date.issued 2014
dc.identifier.citation Journal Of Non-Crystalline Solids, 386, 2014: 14-18
dc.identifier.issn 0022-3093
dc.identifier.uri http://ore.immt.res.in/handle/2018/1960
dc.description DST, Govt. of India, New Delhi
dc.description.abstract Since metal interlayer improves the adhesion, a sequential method of deposition of diamond like carbon (DLC) on Cr has been tried. The Cr interlayer and DLC grown sequentially on Si (100) by pulsed DC magnetron sputtering and microwave plasma CVD (MPCVD), respectively, which resulted in intermixing of DLC and Cr on the upper part of Cr interlayer. The intermixed layer contains nanocrystals of CrC which most likely contributes to formation of a relatively hard (18 GPa) DLC with high modulus (up to 320 GPa) and improved adhesion. (C) 2013 Elsevier B.V. All rights reserved.
dc.language en
dc.publisher Elsevier
dc.relation.isreferencedby SCI
dc.rights Copyright [2014]. All efforts have been made to respect the copyright to the best of our knowledge. Inadvertent omissions, if brought to our notice, stand for correction and withdrawal of document from this repository.
dc.subject Materials Sciences
dc.subject Materials Sciences
dc.title A study of diamond like carbon/chromium films deposited by microwave plasma activated chemical vapor deposition
dc.type Journal Article
dc.affiliation.author CSIR-IMMT, Bhubaneswar 751013, Odisha, India


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