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Electrophoretic Deposition of Ti3SiC2 and Texture Development in a Strong Magnetic Field

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dc.contributor.author Mishra, M.
dc.contributor.author Sakka, Y.
dc.contributor.author Hu, C.F.
dc.contributor.author Suzuki, T.S.
dc.contributor.author Uchikoshi, T.
dc.contributor.author Besra, L.
dc.date.accessioned 2018-10-01T12:25:03Z
dc.date.available 2018-10-01T12:25:03Z
dc.date.issued 2012
dc.identifier.citation Journal Of The American Ceramic Society, 95(9), 2012: 2857-2862
dc.identifier.issn 0002-7820
dc.identifier.uri http://ore.immt.res.in/handle/2018/1793
dc.description JSPS of Japan
dc.description.abstract In this study,we have shown the applicability of electrophoretic deposition (EPD) for shape-forming in Ti3SiC2-a representative MAX phase; and viability of texture development thereof by application of a strong magnetic field (12 T). The dispersion characteristics of Ti3SiC2 suspension were investigated in terms of surface charge, rheological measurement, and adsorption study. Polyethyleneimine has been used as dispersant to stabilize the suspension. It was found that the iso-electric point (IEP) of Ti3SiC2 powder was pHIEP 4. The surface charge of powder changed in presence of the Polyethyleneimine dispersant and IEP shifted significantly towards basic pH 10. The shift in IEP has been quantified in terms of ?G0SP, the specific free energy of adsorption between the surface sites and the adsorbing polyelectrolyte (PEI) (The value of ?G0SP obtained is -9.521 RT units). The optimized suspension parameters for EPD were determined as 10 vol% Ti3SiC2 and 1 dwb PEI in 50% ethanolic water at pH similar to 7. X-ray diffraction analysis of the textured samples developed, revealed that the preferred orientation of Ti3SiC2 grains parallel to the magnetic field direction was along the a, b-axis (The Lotgering orientation factors on the textured top surface and textured side surface were determined as fL(hk0) = 0.35 and fL(00l) = 0.75, respectively).
dc.language en
dc.publisher Wiley
dc.relation.isreferencedby SCI
dc.rights Copyright [2012]. All efforts have been made to respect the copyright to the best of our knowledge. Inadvertent omissions, if brought to our notice, stand for correction and withdrawal of document from this repository.
dc.subject Materials Sciences
dc.title Electrophoretic Deposition of Ti3SiC2 and Texture Development in a Strong Magnetic Field
dc.type Journal Article
dc.affiliation.author Natl Inst Mat Sci, Adv Mat Proc Unit, Tsukuba, Ibaraki 3050047, Japan


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