| dc.contributor.author |
Pradhan, S.S. |
|
| dc.contributor.author |
Pradhan, Siddhartha Kumar |
|
| dc.contributor.author |
Bagchi, S. |
|
| dc.contributor.author |
Barhai, P.K. |
|
| dc.date.accessioned |
2018-10-01T12:23:49Z |
|
| dc.date.available |
2018-10-01T12:23:49Z |
|
| dc.date.issued |
2011 |
|
| dc.identifier.citation |
Journal Of Crystal Growth, 330(1), 2011: 1-4 |
|
| dc.identifier.issn |
0022-0248 |
|
| dc.identifier.uri |
http://ore.immt.res.in/handle/2018/1579 |
|
| dc.description |
CSIR; DST (Fast Track), India |
|
| dc.description.abstract |
The growth of TiO2 nanorods by a simple sputtering method is reported. Here we show that by sputtering of Ti target in argon-oxygen plasma it is possible to grow rutile core and anatase shell heterostructure TiO2 nanorods on gold (Au) coated Si(1 0 0) substrate without external heating. It seems that the nanorods grow because of the stress assisted diffusion of under-laying Au atoms into the TiO2 film followed by catalytic growth of the nanorods at the root. (C) 2011 Elsevier B.V. All rights reserved. |
|
| dc.language |
en |
|
| dc.publisher |
Elsevier |
|
| dc.relation.isreferencedby |
SCI |
|
| dc.rights |
Copyright [2011]. All efforts have been made to respect the copyright to the best of our knowledge. Inadvertent omissions, if brought to our notice, stand for correction and withdrawal of document from this repository. |
|
| dc.subject |
Chemical Sciences |
|
| dc.subject |
Materials Sciences |
|
| dc.subject |
Physical Sciences |
|
| dc.title |
Root growth of TiO2 nanorods by sputtering |
|
| dc.type |
Journal Article |
|
| dc.affiliation.author |
CSIR-IMMT, Bhubaneswar 751013, Odisha, India |
|